The TiO2 thin films were prepared by vacuum evaporation on glass using TiO2 powder 99.99% as coating material and with varying deposition speed. The TiO2 thin films were characterized by a-step device, X-ray diffraction (XRD), atomic force microscope (AFM). The influence of deposition rate were discussed. The results indicated that thickness of the TiO2 thin film was prepared under the deposition rate of 4/sec was 200 nm at room temperature, with amorphous structure. The film changed to anatase crystal structure when was annealed at 450 C for one hour and the TiO2 thin film was uniform and well combined with the glass substrate.